PVD Vacuum Magnetron Sputtering coaters

Specifications

Vacuum Coaters Machine uBu-1660
1.Features multi-target magnetron sputtering
2.Layer: Titanium Nitride
3.ISO9001:2000.

1.The device features a multi-target magnetron sputtering

2.The equipment is a reasonable structure, coating evevly into good-quality, pumping speed, the cycle of short, high efficiency and easy operation, low energy consumption and performance advantages of stability.

3.It can satisfy tools for plating coating quality (hardness and thickness, smoothness, etc.) and membrane layer and the basal adhesion of strict requirement, also can meet the adornment of plating film thickness, membrane layer colour and lustre and finish aspects for the high demand

4.PVD Vacuum Titanium Nitride Layer is used for coating anti-abrasive films (such as TiN, TiC and TiALN), anti-corrosive films (such as Cr, TiN), decorative films (gold-imitation TiN) such as watchcase, little hardware and ceramic decoration.

 

 

Furnace diameter	1660
Power	6 200A inverter power supply with conversion capabilities,three-way Sevenstar meter, automatic air power
Inverter bias	12kw
Pump	KT-600 diffusion pump , ZJP-300 Roots pump, 2X-70 rotary vane pump 1 set, 2X-15 rotary vane pump 1 set
Multi-Arc target	6+4,the center of four target holes, you can install two pairs of twin targets,
Note	Can be designed according to customers request

Sputtering target sputtering power supply to replace the traditional use of medium frequency DC power supply