Ceramic PVD Chrome/Nickel Sputtering Coating System, Electroless Nickel Plating Equipment

Ceramic PVD Chrome/Nickel Sputtering Coating System,   Electroless Nickel Plating Equipment

The MSC-1215 is designed for nickel thin conductive film's coating on  3C products, especially on eletrode plate's coating.

Sputtering Materials for conductive  films:  Cu (Copper), Ni (Nickel), Ag (silver) based on different coating recipes and coating processes requirement. 

PVD sputtering gives a combination of advantages like no other:

• It is totally economically efficient generating the thinnest and most uniform coating films; 
• It is a dry coating process at low temperature in a vacuum chamber; 
• It offers great versatility, can be used for the deposition of conductive or non-conductive materials on any 
• type of substrates, like: metals, ceramics, plastic materials. 
• Multi layers coating are available.  
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 VAKIA-MSC1215 Specifications

Any customized equipment is available for a special application. 

Please contact us today, Vakia Vacuum Coating is honored to be your your business partner.