Hafnium nitride 0.5-1 μm submicron 10 kg, 25 kg supply, Forsman Technology - Ultra high temperature

500g 1kg 10kg 25kg

Hafnium nitride powder

Basic information

Product name: Hafnium nitride powder

Molecular formula: HfN

Molecular mass: 192.5

CAS#：25817-87-2 

Melting point: 3310 °c

Density (20°C): 13.2 g/cm³

Appearance form: black powder

Microhardness: 16 GPa

Solubility: Quite stable, but easy to be corroded by aqua regia, concentrated. sulfuric acid, hydrofluoroacid.

Storage conditions: Stored in a cool, ventilated warehouse, sealed and preserved.

Uses of Hafnium nitride

Hafnium carbide is the most refractory binary compound known, while hafnium nitride has the highest melting point (3310 °C) among metal nitrides. It has a new ceramic material with excellent properties such as high temperature resistance, corrosion resistance, wear resistance, thermal shock resistance, low density and high hardness, and is mainly used in high temperature resistance, oxidation resistance, aviation, aerospace and other fields.

(1) Widely used in the field of decorative protective layer, anti-wear outer film of knives, as well as chemically inertable film and high temperature resistant protective film.

(2) Hafnium nitride is not only superior to pure metal hafnium in terms of wear resistance, oxidation resistance, corrosion resistance and conductivity, but also has a high superconducting critical temperature, which is likely to become a good superconductor.

Product advantages

Forsman's hafnium nitride powder product range is of high purity, and the factory can produce products of different particle sizes such as nano, submicron, and micron grades, which can provide particle sizes of 0.5-1 μm and more, and accept other particle size customizations from customers. The standard packaging specifications are 2kg, 10kg, 25kg, and we can supply kilogram products according to customer needs.

Product display

Fig. 7210001 Hafnium nitride powder 0.5-1 μm

Fig. Hafnium nitride powder product packaging

Source Factory、Research and development

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