Porous titanium plate

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Porous titanium plate is a type of material that is characterized by its interconnected network of pores. It is made from titanium, which is a lightweight, strong, and corrosion-resistant metal. The porosity of the titanium plate allows for increased surface area, which can be useful in applications such as filtration, catalysis, and biomedical implants.

Product Parameters

Brand: TOPTITECH

Porosity: 30-40%

Filtration rate: 1um-50um

Temperature: ≤300℃

Size: Customized

Porous titanium plate has several features that make it a unique material.

First, the pore size and distribution can be controlled during manufacturing, allowing for customization of the material for specific applications.

The interconnected network of pores also allows for fluid or gas flow through the material, making it useful for filtration and catalysis.

Porous titanium plate is also biocompatible, which makes it suitable for use in biomedical applications.

Porous titanium plate has a wide range of applications in various industries. In biomedical applications, it is commonly used for bone implants, where the porous structure allows for better integration with surrounding bone tissue. It is also used in dental implants, where the porous structure allows for better anchoring of the implant. In the chemical industry, porous titanium plate is used for catalysis, where the high surface area and pore structure allow for efficient chemical reactions. It is also used in filtration applications, such as air and water filters.

Porous titanium plate can be manufactured using several techniques, including powder metallurgy, sintering, and electrochemical deposition. In powder metallurgy, titanium powder is mixed with a binder material and then pressed into a desired shape. The material is then sintered to remove the binder and fuse the titanium particles together. In electrochemical deposition, a layer of titanium is deposited onto a substrate using an electrochemical process. The resulting layer can be made porous by controlling the deposition parameters.